JPH041846B2 - - Google Patents
Info
- Publication number
- JPH041846B2 JPH041846B2 JP58252059A JP25205983A JPH041846B2 JP H041846 B2 JPH041846 B2 JP H041846B2 JP 58252059 A JP58252059 A JP 58252059A JP 25205983 A JP25205983 A JP 25205983A JP H041846 B2 JPH041846 B2 JP H041846B2
- Authority
- JP
- Japan
- Prior art keywords
- pattern
- white
- black
- defects
- window
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/956—Inspecting patterns on the surface of objects
- G01N21/95607—Inspecting patterns on the surface of objects using a comparative method
Landscapes
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP58252059A JPS60143704A (ja) | 1983-12-29 | 1983-12-29 | パタ−ンの欠陥検査方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP58252059A JPS60143704A (ja) | 1983-12-29 | 1983-12-29 | パタ−ンの欠陥検査方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS60143704A JPS60143704A (ja) | 1985-07-30 |
JPH041846B2 true JPH041846B2 (en]) | 1992-01-14 |
Family
ID=17231988
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP58252059A Granted JPS60143704A (ja) | 1983-12-29 | 1983-12-29 | パタ−ンの欠陥検査方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS60143704A (en]) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW417133B (en) * | 1998-11-25 | 2001-01-01 | Koninkl Philips Electronics Nv | Method of manufacturing a cathode ray tube, in which a display screen is inspected |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS54143168A (en) * | 1978-04-28 | 1979-11-08 | Fuji Electric Co Ltd | Appearance tester |
JPS582844A (ja) * | 1981-06-29 | 1983-01-08 | Fujitsu Ltd | フオトマスクの検査方法 |
JPS5846636A (ja) * | 1981-09-16 | 1983-03-18 | Nippon Jido Seigyo Kk | パタ−ンの欠陥検査装置 |
JPS5861629A (ja) * | 1981-10-09 | 1983-04-12 | Hitachi Ltd | ビツトパタ−ン発生装置 |
JPS58147114A (ja) * | 1982-02-26 | 1983-09-01 | Nippon Jido Seigyo Kk | パタ−ンの欠陥検査方法 |
-
1983
- 1983-12-29 JP JP58252059A patent/JPS60143704A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS60143704A (ja) | 1985-07-30 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
EXPY | Cancellation because of completion of term |